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UV Copying Lens
High-fidelity mask imaging at UV wavelengths for high-resolution, distortion-free pattern projection.
Key features
- Demagnification range 2.5 – 6x
- 1.5 µm resolution with 65%/µm edge contrast
- Designed for 20 x 20 mm masks
- Image distortion <10-5
- Half-telecentric
- Long working distance
- Fully coated optics for high efficiency
- High energy handling capacity
- Available at popular UV machining wavelengths
Specification
| Design base | Petzval + Aplanat |
| N° of elements | 5 x UVFS |
| Wavelength range | 190 – 355 nm (AR-coating specific) |
| Clear aperture | 39 mm |
| Effective focal length @ 248 nm | 144.6 mm |
| Demagnification range | 2.5 – 6x |
| Overall length | 95 mm |
| Overall diameter | 58 mm |
| Mount thread | M50 x 1 mm |
| Object-image distance | 901 mm |
| Back focal distance | 137 mm |
| F-number | 4.7 |
| Image field | 5 x 5 mm |
| Image distortion | <10-5 |
| Resolution 15-85% | 1.5 µm |
| Edge contrast | 65%/µm |
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